作者:jahda4659
积分:74
等级:学前班
2018-9-21 15:48:55
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楼主(阅:3852/回:0)China CVD Furnace SystemThis is a small PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system. The equipment consists of a 500W RF plasma generator, a open-type tube furnace that the diameter is 50mm(with a vacuum flange and connecting pipe), and a direct connection double rotary mechanical pump. So this set of device models can be updated to different PECVD systems. This system is ideal for the material exploration under a limited budget. 1)Lower temperature processing compared to conventional CVD. 2)Film stress can be controlled by high/low frequency mixing techniques. 3)Control over stoichiometry via process conditions. 4)Can do a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition.China CVD Furnace System website:http://www.haoyueavp.com/tube-furnaces/cvd-furnace-system/ |
上海中芜网络
中国地铁卡网
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